Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas. 2000.
KLA Tencor — Infobox Company company name = KLA Tencor Corporation company company type = Public company|Public] (NASDAQ|KLAC) slogan = Accelerating Yield foundation = 1997 location = San Jose, California key people = Edward W. (Ned) Barnholt, Chairman… … Wikipedia
Fotomaskendefekt — fotokaukės defektas statusas T sritis radioelektronika atitikmenys: angl. photomask defect vok. Fotomaskendefekt, m rus. дефект фотошаблона, m pranc. défaut de photomasque, m … Radioelektronikos terminų žodynas
défaut de photomasque — fotokaukės defektas statusas T sritis radioelektronika atitikmenys: angl. photomask defect vok. Fotomaskendefekt, m rus. дефект фотошаблона, m pranc. défaut de photomasque, m … Radioelektronikos terminų žodynas
fotokaukės defektas — statusas T sritis radioelektronika atitikmenys: angl. photomask defect vok. Fotomaskendefekt, m rus. дефект фотошаблона, m pranc. défaut de photomasque, m … Radioelektronikos terminų žodynas
дефект фотошаблона — fotokaukės defektas statusas T sritis radioelektronika atitikmenys: angl. photomask defect vok. Fotomaskendefekt, m rus. дефект фотошаблона, m pranc. défaut de photomasque, m … Radioelektronikos terminų žodynas
Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… … Wikipedia
Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is … Wikipedia
Electronic design automation — (EDA) is the category of tools for designing and producing electronic systems ranging from printed circuit boards (PCBs) to integrated circuits. This is sometimes referred to as ECAD (electronic computer aided design) or just CAD. (Printed… … Wikipedia
Phase-shift mask — Phase shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography. There exist alternating [cite web|url = http://www.freepatentsonline.com/6977127.html | title … Wikipedia
